Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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10:25 min
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September 14th, 2018
DOI :
September 14th, 2018
•Rozdziały w tym wideo
0:04
Title
1:03
Sample Preparation for Resist Coating
2:27
Load Sample in STEM, Map Window Coordinates, and Perform High-Resolution Focusing
4:54
Expose Patterns Using an Aberration-Corrected STEM Equipped with a Pattern Generator System
6:44
Resist Development and Critical Point Drying
8:09
Results: Nanometer-Scale Lithographic Patterns in HSQ and PMMA (Positive and Negative Tone)
9:14
Conclusion
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